PLD system
- Systems
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Systems
TSST Pulsed Laser Deposition systems for thin film growth are state-of-the-art, highly flexible systems for thin film research at atomic level, ideally suited and field proven for research on a large variety of materials including complex oxides. Our customised design approach allows various types of heating, with which temperatures up to 1000°C are obtained. A base pressure below 10-7 mbar is guaranteed, with UHV upgrade possibilities. Pressure is regulated through automated upstream and downstream control, which combines fast pressure set-point control. To guarantee high vacuum quality, the system can be equipped with a load-lock for sample and target carrousel exchange, optionally extended with heater and target storage possibilities. A six targets carousel is mounted on a stage which is controlled by the software, including spinning of the targets to ensure a large ablation area and prevent drilling.
A short outline:
- Thin film growth of highest quality complex materials
- Fully customised design, including adaptation to a specific lab layout
- Remote support, service and on-site training by TSST engineers
- Down to 10-7 mbar base pressure
- Up to 1000°C growth temperature
- Up to 6 different targets for heterostructure growth.
Specifications
Typical System Specifications (* optional)
Vacuum Chamber


- Chamber shape
- Cylindrical, spherical*
- Base Pressure
- <10-7 mbar, <10-8 mbar*
- Pumping
- Turbo (300l/min), Turbo (700l/min)*
- Bakeout*
- Heating tape
- Process gasses, pressure
- O2, Ar, N2, automated* up/downstream pressure control
Heater Stage


- Radiation
- Up to 10000C, <2" substrates
- Resistive
- Up to 9000C, <1" substrates
- Movement
- Z, (X, Y)*, continuous rotation*
- Shutter
- Prevents contamination of targets during (pre)ablation
Target Stage


- Movement
- Spinning, Z*, (X, Y, Z, scanning stage)*
- Amount of targets
- Up to 6
- Targetsize
- Up to 1", 2"*
- Transfer
- Whole carousel, individual*
Optics


- Fluence
- Full range flexibility for complex materials and metal ablation
- Spotsize
- 1.0-3.0 mm2, homogeneous fluence by mask imaging
- Safety
- Fully enclosed, UV tight, visually transparant
Loadlock*


- Pumping
- Turbo (>70l/min)
- Base pressure
- <10-5 mbar
TSST CONTROL SOFTWARE
- Full manual to automated control, including growth recipes and parameter logging