PLD system

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TSST Pulsed Laser Deposition systems for thin film growth are state-of-the-art, highly flexible systems for thin film research at atomic level, ideally suited and field proven for research on a large variety of materials including complex oxides. Our customised design approach allows various types of heating, with which temperatures up to 1000°C are obtained. A base pressure below 10-7 mbar is guaranteed, with UHV upgrade possibilities. Pressure is regulated through automated upstream and downstream control, which combines fast pressure set-point control. To guarantee high vacuum quality, the system can be equipped with a load-lock for sample and target carrousel exchange, optionally extended with heater and target storage possibilities. A six targets carousel is mounted on a stage which is controlled by the software, including spinning of the targets to ensure a large ablation area and prevent drilling.

A short outline:

  • Thin film growth of highest quality complex materials
  • Fully customised design, including adaptation to a specific lab layout
  • Remote support, service and on-site training by TSST engineers
  • Down to 10-7 mbar base pressure
  • Up to 1000°C growth temperature
  • Up to 6 different targets for heterostructure growth.


Typical System Specifications (* optional)

Vacuum Chamber

  • Chamber shape
  • Cylindrical, spherical*
  • Base Pressure
  • <10-7 mbar, <10-8 mbar*
  • Pumping
  • Turbo (300l/min), Turbo (700l/min)*
  • Bakeout*
  • Heating tape
  • Process gasses, pressure
  • O2, Ar, N2, automated* up/downstream pressure control

Heater Stage

  • Radiation
  • Up to 10000C, <2" substrates
  • Resistive
  • Up to 9000C, <1" substrates
  • Movement
  • Z, (X, Y)*, continuous rotation*
  • Shutter
  • Prevents contamination of targets during (pre)ablation

Target Stage

  • Movement
  • Spinning, Z*, (X, Y, Z, scanning stage)*
  • Amount of targets
  • Up to 6
  • Targetsize
  • Up to 1", 2"*
  • Transfer
  • Whole carousel, individual*


  • Fluence                             
  • Full range flexibility for complex materials and metal ablation
  • Spotsize                           
  • 1.0-3.0 mm2, homogeneous fluence by mask imaging
  • Safety
  • Fully enclosed, UV tight, visually transparant


  • Pumping
  • Turbo (>70l/min)
  • Base pressure
  • <10-5 mbar


  • Full manual to automated control, including growth recipes and parameter logging